A study of filter transport mechanisms in filtered cathodic vacuum arcs

Ion transport in a magnetically filtered cathodic arc thin film deposition system is investigated. The plasma floating potential, ion current and deposition rate profiles are used to show that the ion density profile is a function of the magnetic field configuration alone although the magnitude of the ion density increases linearly with magnetic field strength. The magnetic mirror effect, electron diffusion and ion centrifugal drift are identified as the dominant loss mechanisms. The results can be used to design optimal filter systems and to control deposition rate profiles. The effect of reactive gas pressure is also examined