A study of filter transport mechanisms in filtered cathodic vacuum arcs

Author

Bilek, Marcela M.M. ; Yin, Yongbai ; McKenzie, David R.

Author_Institution

Dept. of Eng., Cambridge Univ., UK

Volume

24

Issue

3

fYear

1996

fDate

6/1/1996 12:00:00 AM

Firstpage

1165

Lastpage

1173

Abstract

Ion transport in a magnetically filtered cathodic arc thin film deposition system is investigated. The plasma floating potential, ion current and deposition rate profiles are used to show that the ion density profile is a function of the magnetic field configuration alone although the magnitude of the ion density increases linearly with magnetic field strength. The magnetic mirror effect, electron diffusion and ion centrifugal drift are identified as the dominant loss mechanisms. The results can be used to design optimal filter systems and to control deposition rate profiles. The effect of reactive gas pressure is also examined

Keywords

filters; filtration; magnetic mirrors; plasma density; plasma deposition; plasma transport processes; vacuum arcs; deposition rate profiles; electron diffusion; filter transport mechanisms; filtered cathodic vacuum arcs; ion centrifugal drift; ion current; ion density profile; ion transport; magnetic field configuration; magnetic mirror effect; optimal filter systems; plasma floating potential; reactive gas pressure; thin film deposition; Control systems; Electrons; Filters; Magnetic fields; Magnetic separation; Mirrors; Optimal control; Plasma density; Plasma transport processes; Sputtering;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/27.533126

Filename

533126