• DocumentCode
    1328944
  • Title

    Sputtering of SmCo Thin Films and Integration Into a Ferrofluidic Microactuator

  • Author

    Jue Chen ; Hoheisel, Dominik ; Rising, L.

  • Author_Institution
    Center for Production Technol., Leibniz Univ. Hannover, Garbsen, Germany
  • Volume
    47
  • Issue
    10
  • fYear
    2011
  • Firstpage
    4473
  • Lastpage
    4476
  • Abstract
    The fabrication of SmCo films using physical vapor deposition (PVD), patterning by wet-chemical etching, and liftoff techniques as well as annealing processes was investigated. The composition of the film can be adjusted by the applied sputter parameters, i.e., the deposition pressure, the substrate bias voltage, and the power density by using a composite target. An intrinsic coercivity Hci of sputtered SmCo films above 0.8 MA/m and a maximal energy product |B XH|max of above 70 kJ/m3 were achieved after an annealing process, respectively. A concept for the integration of sputtered SmCo permanent magnets in a ferrofluidic microactuator is presented. This microactuator consists of microcoil arrays which manipulate a ferrofluid plug in a microchannel. The permanent magnets provide holding positions for fixing the ferrofluid without power input.
  • Keywords
    annealing; cobalt alloys; coercive force; etching; magnetic fluids; magnetic thin films; metallic thin films; microactuators; permanent magnets; samarium alloys; sputter deposition; SmCo; annealing; coercivity; ferrofluidic microactuator; liftoff technique; permanent magnets; physical vapor deposition; power density; sputtering; substrate bias voltage; thin films; wet-chemical etching; Annealing; Coils; Etching; Microactuators; Permanent magnets; Sputtering; Stators; Active microoptics; SmCo; electromagnetic microactuator; ferrofluid; sputtering;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.2011.2147290
  • Filename
    6027570