Title :
Enhancement of Exchange Bias in the
System
Author :
Aley, N.P. ; Takayama, S. ; Hirohata, Atsufumi ; O´Grady, K.
Author_Institution :
Dept. of Electr. & Electron. Eng., Hosei Univ., Koganei, Japan
Abstract :
The structural and magnetic properties of sputtered polycrystalline Co2FeSi (CFS) thin films have been studied. A combination of magnetometry, X-ray diffraction, and X-ray photon spectrometry have been used to measure the changes in magnetization, coercivity, grain size and compositional depth profile as a function of annealing conditions and seed-layer choice. The CFS thin films displayed an ordered B2 structure when deposited on a Cr seed layer and annealed at 573 K. Further increases in annealing temperature were found to disrupt the crystallinity of the CFS and lead to Si segregation at the interface. After obtaining an optimized growth process, a study of the exchange biasing of CFS with the antiferromagnetic (AF) IrMn was made. A 15% enhancement of the exchange bias of CFS was found when an ultra-thin-layer CoFe was added at the CFS/IrMn interface due to an increase in the strength of the interfacial coupling.
Keywords :
X-ray diffraction; antiferromagnetic materials; cobalt compounds; coercive force; exchange interactions (electron); grain size; iridium compounds; iron compounds; magnetic annealing; magnetic thin films; Co2FeSi-IrMn; Si segregation; X-ray diffraction; X-ray photon spectrometry; annealing temperature; antiferromagnetic IrMn; coercivity; crystallinity; exchange bias; grain size; interfacial coupling; magnetic properties; magnetization; magnetometry; seed-layer choice; sputtered polycrystalline thin films; structural properties; ultra-thin-layer CoFe; Annealing; Buffer layers; Grain size; Metals; Silicon; Temperature measurement; X-ray scattering; ${rm Co}_{2}{rm FeSi}$; Heusler alloy; exchange bias; structure;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2011.2151838