Title :
Effect of Using Oblique-Incidence Deposited Ru Interlayers Deposited by Evaporation and Sputtering on Recording Characteristics of Perpendicular Media
Author :
Saito, Sakuyoshi ; Inoue, Ken ; Takahashi, Masaharu
Author_Institution :
Dept. of Electron. Eng., Tohoku Univ., Sendai, Japan
Abstract :
Oblique-incidence evaporation and sputtering were performed to investigate the effect of reducing the Ru interlayer thickness on the recording characteristics of perpendicular magnetic recording media. Deep gaps were observed at grain boundaries on oblique-incidence evaporated and sputtered films when the incident angle was over 60°. Evaporated Ru films have a lower density than sputtered Ru films at the same incident angle. This indicates that the self-shadowing effect predominantly occurs due to suppression of migration of deposited atoms for evaporation films. However, degradation of the crystal orientation is observed in evaporated Ru films due to the present experimental limitations. Examination of the recording characteristics revealed that the Ru interlayer thickness can be reduced by using an oblique-incidence sputtered Ru interlayer and the writing ability can be improved by reducing the spacing loss between the head and the soft magnetic underlayer.
Keywords :
grain boundaries; magnetic thin films; metallic thin films; perpendicular magnetic recording; ruthenium; sputter deposition; vacuum deposition; Ru; crystal orientation; grain boundaries; head magnetic underlayer; oblique-incidence evaporation; perpendicular magnetic recording media; ruthenium interlayer thickness; self-shadowing effect; soft magnetic underlayer; spacing loss; sputter film deposition; Atomic layer deposition; Diffraction; Media; Perpendicular magnetic recording; Sputtering; Writing; CoPtCr-SiO $_{2}$ granular film; oblique-incidence deposition; perpendicular recording media; reduction of Ru interlayer;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2011.2157329
