DocumentCode :
1331025
Title :
\\hbox {VO}_{2} Thin-Film Varistor Based on Metal-Insulator Transition
Author :
Kim, Bong-Jun ; Lee, Yong Wook ; Choi, Sungyoul ; Yun, Sun Jin ; Kim, Hyun-Tak
Author_Institution :
MIT Device Team, ETRI, Daejeon, South Korea
Volume :
31
Issue :
1
fYear :
2010
Firstpage :
14
Lastpage :
16
Abstract :
For electronic applications, we have fabricated VO2 thin-film variable resistors (varistors) using metal-insulator transition regarded as the abrupt current jump. The increase of the number of parallel stripe patterns in the varistor leads to the increase in current below a current-jump voltage, which endures a high surge voltage with high current and short rising time. Electrostatic discharge (ESD) experiments show that the varistic coefficient of 500 is larger than 30-80, which is known for commercial ZnO varistors. In overvoltage-protection tests applying high ESD voltages up to 3.3 kV to a varistor, the maximum response voltage is lower than 200 V at an ESD voltage of 1600 V, and the electronic response time is less than 20 ns. This is sufficient to protect a device perfectly.
Keywords :
electrostatic discharge; metal-insulator transition; thin film resistors; vanadium compounds; varistors; VO2; electrostatic discharge; metal-insulator transition; parallel stripe patterns; thin-film variable resistors; thin-film varistor; Electrostatic discharge (ESD); metal-insulator transition (MIT); surge protection; variable resistor (varistor);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2009.2034763
Filename :
5332371
Link To Document :
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