DocumentCode :
1332620
Title :
Single Germanium Quantum-dot Placement Along With Self-Aligned Electrodes for Effective Management of Single Charge Tunneling
Author :
Chen, Inn-Hao ; Chen, Kuan-Hung ; Lai, Wei-Ting ; Li, Pei-Wen
Author_Institution :
Dept. of Electr. Eng., Nat. Central Univ., Jhongli, Taiwan
Volume :
59
Issue :
12
fYear :
2012
Firstpage :
3224
Lastpage :
3230
Abstract :
We demonstrated the controlled placement of a Ge quantum dot (QD) along with tunnel-junction engineering in a self-organized approach for the effective management of single charge tunneling. In this approach, a single-Ge-QD ( ~ 11 nm) self-aligning with nickel-polycide electrodes is realized by thermally oxidizing a SiGe nanorod that bridges a 15-nm-wide nanotrench in close proximity to electrodes via a spacer bilayer of Si3N4/SiO2. The fabricated Ge-QD single-hole transistor exhibits clear Coulomb oscillation and Coulomb diamond behaviors at T = 77 K-150 K, providing a way to analyze the electronic structure of the Ge QD.
Keywords :
Ge-Si alloys; electrodes; electronic structure; nanorods; oxidation; semiconductor materials; semiconductor quantum dots; silicon compounds; single electron transistors; tunnelling; Coulomb diamond behaviors; Coulomb oscillation; Si3N4-SiO2; SiGe; electronic structure analysis; fabricated germanium-QD single-hole transistor; nanorod; nanotrench; nickel-polycide electrodes; self-aligned electrodes; self-organized approach; single charge tunneling effective management; single germanium quantum-dot placement; single-electron transistor; size 15 nm; spacer bilayer; temperature 77 K to 150 K; tunnel-junction engineering; Capacitance; Diamond-like carbon; Electrodes; Energy states; Logic gates; Silicon germanium; Tunneling; Ge; quantum dot (QD) placement; self-aligned electrode; single electron;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2012.2217973
Filename :
6352881
Link To Document :
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