Title :
Terahertz waveguide components fabricated using a 3D X-ray microfabrication technique
Author :
Moon, S.W. ; Mann, C.M. ; Maddison, B.J. ; Turcu, I.C.E. ; Allot, R. ; Hug, S.E. ; Lisi, N.
Author_Institution :
Rutherford Appleton Lab., Chilton, UK
fDate :
9/12/1996 12:00:00 AM
Abstract :
A novel process using embedded X-ray masks that allows the fabrication of 3D terahertz waveguide components is demonstrated. X-rays produced by a laser plasma source are used to expose a chemically amplified resist. To produce structures with the required depth (~50 μm) a cyclic exposure and development technique is used. A representative waveguide cavity intended for operation at 2.5 THz is realised
Keywords :
X-ray lithography; submillimetre wave devices; waveguide components; 2.5 THz; 3D X-ray microfabrication; 50 micron; THF; chemically amplified resist; cyclic exposure/development technique; embedded X-ray masks; laser plasma source; terahertz waveguide components;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19961166
