Remote millimeter-wave beam control by the illumination of a semiconductor

Author

Brand, G.F.

Author_Institution

Sch. of Phys., Sydney Univ., NSW, Australia

Volume

48

Issue

5

fYear

2000

fDate

5/1/2000 12:00:00 AM

Firstpage

855

Lastpage

857

Abstract

The aim of this paper is to use diffraction gratings, produced by projecting a grating pattern onto a semiconductor wafer from a remote location, to control the direction of a reflected beam. We find the conditions for which diffraction at the specular angle is small so that most of the radiation goes into adjacent interference maxima whose directions may be controlled by changing the period of the projected pattern. Some preliminary experiments are reported

Keywords

diffraction gratings; electromagnetic wave diffraction; electromagnetic wave reflection; microwave photonics; millimetre wave devices; millimetre waves; optical control; semiconductor plasma; diffraction gratings; grating pattern projection; millimeter-wave beam control; photo-induced electron-hole plasma; projected pattern period; reflected beam direction control; remote millimeter-wave beam control; semiconductor illumination; semiconductor wafer; Conductivity; Diffraction gratings; Interference; Lighting; Millimeter wave technology; Optical diffraction; Optical reflection; Physics; Plasma devices; Strips;

fLanguage

English

Journal_Title

Microwave Theory and Techniques, IEEE Transactions on

Publisher

ieee

ISSN

0018-9480

Type

jour

DOI

10.1109/22.841884

Filename

841884