DocumentCode
1334046
Title
A fluxless bonding technology using indium-silver multilayer composites
Author
Chen, Yi-Chia ; So, William W. ; Lee, Chin C.
Author_Institution
Rockwell Int. Corp., Newport Beach, CA, USA
Volume
20
Issue
1
fYear
1997
fDate
3/1/1997 12:00:00 AM
Firstpage
46
Lastpage
51
Abstract
A fluxless bonding process has been developed using indium-silver multilayer composites deposited on silicon and GaAs wafers in one high vacuum cycle to inhibit the oxidation of the bonding media. The in situ formation of AgIn2 intermetallic outer layer protects the inner media from oxidation when exposed to atmosphere. The bonding process is performed at 180°C temperature in inert environment to prevent oxygen from getting into the specimens. High quality joints are produced as confirmed by a scanning acoustic microscope. The joints are very uniform with a thickness of 4 μm. Scanning electron microscopy (SEM) evaluations reveal that the joint is composed of indium matrix with embedded intermetallic grains. Neither flux nor scrubbing motion is used in the bonding process. The process should be valuable in manufacturing applications where the use of flux cannot be tolerated
Keywords
adhesion; composite materials; indium alloys; silver alloys; 180 C; GaAs; GaAs wafer; In-Ag; Si; fluxless bonding; indium-silver multilayer composite; intermetallic layer; joint; manufacturing process; oxidation protection; scanning acoustic microscopy; scanning electron microscopy; silicon wafer; Atmosphere; Bonding processes; Gallium arsenide; Intermetallic; Nonhomogeneous media; Oxidation; Protection; Scanning electron microscopy; Silicon; Wafer bonding;
fLanguage
English
Journal_Title
Components, Packaging, and Manufacturing Technology, Part A, IEEE Transactions on
Publisher
ieee
ISSN
1070-9886
Type
jour
DOI
10.1109/95.558543
Filename
558543
Link To Document