• DocumentCode
    1334046
  • Title

    A fluxless bonding technology using indium-silver multilayer composites

  • Author

    Chen, Yi-Chia ; So, William W. ; Lee, Chin C.

  • Author_Institution
    Rockwell Int. Corp., Newport Beach, CA, USA
  • Volume
    20
  • Issue
    1
  • fYear
    1997
  • fDate
    3/1/1997 12:00:00 AM
  • Firstpage
    46
  • Lastpage
    51
  • Abstract
    A fluxless bonding process has been developed using indium-silver multilayer composites deposited on silicon and GaAs wafers in one high vacuum cycle to inhibit the oxidation of the bonding media. The in situ formation of AgIn2 intermetallic outer layer protects the inner media from oxidation when exposed to atmosphere. The bonding process is performed at 180°C temperature in inert environment to prevent oxygen from getting into the specimens. High quality joints are produced as confirmed by a scanning acoustic microscope. The joints are very uniform with a thickness of 4 μm. Scanning electron microscopy (SEM) evaluations reveal that the joint is composed of indium matrix with embedded intermetallic grains. Neither flux nor scrubbing motion is used in the bonding process. The process should be valuable in manufacturing applications where the use of flux cannot be tolerated
  • Keywords
    adhesion; composite materials; indium alloys; silver alloys; 180 C; GaAs; GaAs wafer; In-Ag; Si; fluxless bonding; indium-silver multilayer composite; intermetallic layer; joint; manufacturing process; oxidation protection; scanning acoustic microscopy; scanning electron microscopy; silicon wafer; Atmosphere; Bonding processes; Gallium arsenide; Intermetallic; Nonhomogeneous media; Oxidation; Protection; Scanning electron microscopy; Silicon; Wafer bonding;
  • fLanguage
    English
  • Journal_Title
    Components, Packaging, and Manufacturing Technology, Part A, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1070-9886
  • Type

    jour

  • DOI
    10.1109/95.558543
  • Filename
    558543