DocumentCode :
1334069
Title :
Kinetic theory of stochastically heated RF capacitive discharges
Author :
Wang, Zuoding ; Lichtenberg, Allan J. ; Cohen, Ronald H.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
Volume :
26
Issue :
1
fYear :
1998
fDate :
2/1/1998 12:00:00 AM
Firstpage :
59
Lastpage :
68
Abstract :
Stochastic sheath heating is the dominant heating mechanism at low pressures for radio frequency (RF) capacitive discharges. It produces an electron energy probability distribution function (EEPF) that approximates a two-temperature Maxwellian, as seen in both experiments and numerical simulations. We have used the fundamental kinetic equation to obtain a space- and time-averaged kinetic equation. We assume that electrons with the x component kinetic energy lower than a certain threshold Φ are prevented from interacting with the sheath heating fields. With these approximations and either a knowledge of the central density or an ansatz on Φ, we obtain a self-consistent solution for the quasiequilibrium discharge parameters valid for low pressures in argon. The results are compared to those found in experiments, yielding reasonable agreement
Keywords :
high-frequency discharges; plasma heating; plasma kinetic theory; plasma sheaths; stochastic processes; Ar; electron energy probability distribution function; kinetic theory; low pressures; numerical simulations; quasiequilibrium discharge parameters; self-consistent solution; space-averaged kinetic equation; stochastic sheath heating; stochastically heated RF capacitive discharges; time-averaged kinetic equation; two-temperature Maxwellian; Argon; Electrons; Heating; Kinetic energy; Kinetic theory; Maxwell equations; Numerical simulation; Probability distribution; Radio frequency; Stochastic processes;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/27.659533
Filename :
659533
Link To Document :
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