DocumentCode
13342
Title
Uniformity Improvement in 1T1R RRAM With Gate Voltage Ramp Programming
Author
Hongtao Liu ; Hangbin Lv ; Baohe Yang ; Xiaoxin Xu ; Ruoyu Liu ; Qi Liu ; Shibing Long ; Ming Liu
Author_Institution
Lab. of Nanofabrication & Novel Devices Integration, Inst. of Microelectron., Beijing, China
Volume
35
Issue
12
fYear
2014
fDate
Dec. 2014
Firstpage
1224
Lastpage
1226
Abstract
Uniformity is one of the most severe challenges for resistive random access memory (RRAM). In this letter, a novel programming scheme with gate voltage ramping (GVR) is proposed to improve the uniformity of RRAM in a one transistor and one resistor structure. In traditional operation, the gate of the access transistor is biased with a constant voltage and a sweeping voltage is applied to the source or drain during the SET (from HRS to LRS) and RESET (from LRS to HRS) processes. With the GVR scheme, the gate voltage VG is ramped and the source/drain are kept constant. A tight distribution of HRS can be achieved using GVR. Analysis of power generation in the RESET process of the GVR scheme reveals positive feedback from joule heating, which helps to accelerate filament rupture and results in a tendency to achieve full RESET. The intermediate resistance states commonly observed are effectively eliminated.
Keywords
random-access storage; transistor circuits; 1T1R RRAM; GVR; Joule heating; RESET process; SET process; access transistor; constant voltage; filament rupture; gate voltage ramp programming scheme; intermediate resistance states; positive feedback; power generation; resistive random access memory; resistor structure; sweeping voltage; uniformity improvement; Power generation; Programming; Random access memory; Resistance; Voltage control; 1T1R; resistive random access memory (RRAM); resistive switching; uniformity;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2014.2364171
Filename
6936923
Link To Document