DocumentCode :
1336347
Title :
A Light-Field Image Sensor in 180 nm CMOS
Author :
Wang, Albert ; Molnar, Alyosha
Author_Institution :
Cornell Univ., Ithaca, NY, USA
Volume :
47
Issue :
1
fYear :
2012
Firstpage :
257
Lastpage :
271
Abstract :
This paper presents a CMOS image sensor which captures local incident angle and intensity information from the light it records. The 400×384 pixel array employs 7.5 μm angle-sensitive pixels, which use pairs of local diffraction gratings above a photodiode to detect incident angle. The gratings are implemented with the metal interconnect layers of CMOS manufacturing technology and therefore require no post-processing or external optics. Fabricated in a 180 nm mixed-mode CMOS process, the sensor requires only a single lens to create a light-field image. Using the information contained in a single image, we demonstrate range finding with 2.5 mm precision at 1 m and post-capture refocus on complex visual scenes.
Keywords :
CMOS image sensors; light diffraction; mixed analogue-digital integrated circuits; natural scenes; photodiodes; CMOS image sensor; CMOS manufacturing technology; complex visual scenes; incident angle detection; light field image sensor; local diffraction gratings; metal interconnect layers; mixed-mode CMOS process; photodiode; size 180 nm; Arrays; CMOS integrated circuits; Cameras; Diffraction; Diffraction gratings; Gratings; Image sensors; 3D imaging; Angle-sensitive pixel; CMOS image sensor; Talbot effect; computational imaging; light field; rangefinding; synthetic refocus;
fLanguage :
English
Journal_Title :
Solid-State Circuits, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9200
Type :
jour
DOI :
10.1109/JSSC.2011.2164669
Filename :
6031780
Link To Document :
بازگشت