• DocumentCode
    1336845
  • Title

    Two-dimensional numerical simulation of radical generation in the positive corona discharge

  • Author

    Kim, Youn Taeg ; Whang, Ki Woong

  • Author_Institution
    Sch. of Electr. Eng., Seoul Nat. Univ., South Korea
  • Volume
    28
  • Issue
    1
  • fYear
    2000
  • fDate
    2/1/2000 12:00:00 AM
  • Firstpage
    261
  • Lastpage
    267
  • Abstract
    By a two-dimensional (2-D) numerical simulation of positive corona with extensive chemical reactions, two parameters such as E/Neff (effective electric field for electrical energy transfer) and G-factor are calculated. E/Neff weakly depends on the humidity but strongly depends on the applied voltage. As the applied voltage increases, the corona formation and propagation time decrease, but the other parameters show very weak dependence. Electron collision G-factors of OH, O radicals reach their maximum value at E/Neff N~150 Td but electron collision G-factor of N radical increase with E/N. Full chemical reaction considered G-factor shows different time evolution characteristics with E/Neff. Since the dominant reaction process for the N, O radical is through the electron collision, the electron collision G-factor and E/Neff well represent the full chemical reaction considered G-factor. But the OH radical is dominantly generated by the radical reactions. The G-factor of OH radical shows a time-delayed characteristic
  • Keywords
    air pollution; corona; free radicals; humidity; plasma chemistry; plasma collision processes; plasma simulation; 2-D numerical simulation; O; O radicals; OH; OH radicals; acid rain; air pollution; applied voltage; chemical reactions; corona formation; effective electric field; electrical energy transfer; electron collision; electron collision G-factors; humidity; positive corona discharge; propagation time; pulse corona induced plasma chemical process; radical generation; time evolution characteristics; time-delayed characteristic; two-dimensional numerical simulation; Character generation; Chemical processes; Corona; Electrons; Energy exchange; Equations; Fault location; Numerical simulation; Two dimensional displays; Voltage;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.842918
  • Filename
    842918