DocumentCode :
1337064
Title :
Approach to electrochemical C-V profiling in semiconductor with sub-Debye-length resolution
Author :
Shashkin, V.I. ; Karetnikova, Irene R. ; Murel, Arcady ; Nefedov, Igor ; Shereshevski, Ilya A.
Author_Institution :
Inst. for Phys. of Microstruct., Acad. of Sci., Nizhny Novgorod, Russia
Volume :
47
Issue :
6
fYear :
2000
fDate :
6/1/2000 12:00:00 AM
Firstpage :
1221
Lastpage :
1224
Abstract :
Three methods for the determination of the detailed structure of dopant distribution in semiconductors, based on the data of electrochemical C-V profiling, are proposed. The methods give the possibility of determining a dopant distribution directly from a semiconductor surface and providing a sub-Debye length resolution. The results of numerical simulation confirm the possibility of determination of semiconductor dopant profile with nanometer depth resolution
Keywords :
doping profiles; electric variables measurement; numerical analysis; semiconductors; dopant distribution; dopant profile determination; electrochemical C-V profiling data; nanometer depth resolution; numerical simulation; semiconductor surface; sub-Debye-length resolution; Capacitance measurement; Capacitance-voltage characteristics; Doping profiles; Electrons; Etching; Integral equations; Numerical simulation; Semiconductor device doping; Semiconductor materials; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.842965
Filename :
842965
Link To Document :
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