DocumentCode
1337415
Title
Fault Models for Logic Circuits in the Multigate Era
Author
Bhoj, Ajay N. ; Simsir, Muzaffer O. ; Jha, Niraj K.
Author_Institution
Dept. of Electr. Eng., Princeton Univ., Princeton, NJ, USA
Volume
11
Issue
1
fYear
2012
Firstpage
182
Lastpage
193
Abstract
With increased scaling to lower technology nodes, the electrostatic integrity of planar FETs is expected to worsen, necessitating the adoption of low-leakage high-performance multigate FETs, amongst which the FinFET is very attractive with respect to fabrication process complexity. A significant void from a circuit testing viewpoint is the absence of fault models for FinFETs. In particular, it is unclear if CMOS fault models are comprehensive enough to model all defects in FinFET circuits. We investigate the aforementioned problem using mixed-mode FinFET device simulation and demonstrate that while faults defined for planar FETs show significant overlaps with FinFETs, they do not encompass all regimes of operation. Results indicate that no single fault model can adequately capture the leakage-delay behavior of logic gates based on independent-gate FinFETs with opens on the back gate, and shorted-gate FinFETs, which have been accidentally etched into independent-gate structures. To this effect, we categorize back-gate cuts into three regimes where either pulse broadening or pulse shrinking occurs, which can be tested using three-/two-pattern delay fault tests.
Keywords
CMOS integrated circuits; MOSFET; fault tolerance; logic circuits; logic gates; CMOS fault model; electrostatic integrity; high-performance multigate FET; independent-gate FinFET; leakage-delay behavior; logic circuit; logic gate; low-leakage FET; mixed-mode FinFET device; planar FET; pulse broadening; pulse shrinking; CMOS integrated circuits; Circuit faults; Delay; FinFETs; Integrated circuit modeling; Logic gates; Semiconductor device modeling; Device simulation; FinFETs; fault models; independent-gate structure; leakage; shorted-gate structure;
fLanguage
English
Journal_Title
Nanotechnology, IEEE Transactions on
Publisher
ieee
ISSN
1536-125X
Type
jour
DOI
10.1109/TNANO.2011.2169807
Filename
6032105
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