• DocumentCode
    1337415
  • Title

    Fault Models for Logic Circuits in the Multigate Era

  • Author

    Bhoj, Ajay N. ; Simsir, Muzaffer O. ; Jha, Niraj K.

  • Author_Institution
    Dept. of Electr. Eng., Princeton Univ., Princeton, NJ, USA
  • Volume
    11
  • Issue
    1
  • fYear
    2012
  • Firstpage
    182
  • Lastpage
    193
  • Abstract
    With increased scaling to lower technology nodes, the electrostatic integrity of planar FETs is expected to worsen, necessitating the adoption of low-leakage high-performance multigate FETs, amongst which the FinFET is very attractive with respect to fabrication process complexity. A significant void from a circuit testing viewpoint is the absence of fault models for FinFETs. In particular, it is unclear if CMOS fault models are comprehensive enough to model all defects in FinFET circuits. We investigate the aforementioned problem using mixed-mode FinFET device simulation and demonstrate that while faults defined for planar FETs show significant overlaps with FinFETs, they do not encompass all regimes of operation. Results indicate that no single fault model can adequately capture the leakage-delay behavior of logic gates based on independent-gate FinFETs with opens on the back gate, and shorted-gate FinFETs, which have been accidentally etched into independent-gate structures. To this effect, we categorize back-gate cuts into three regimes where either pulse broadening or pulse shrinking occurs, which can be tested using three-/two-pattern delay fault tests.
  • Keywords
    CMOS integrated circuits; MOSFET; fault tolerance; logic circuits; logic gates; CMOS fault model; electrostatic integrity; high-performance multigate FET; independent-gate FinFET; leakage-delay behavior; logic circuit; logic gate; low-leakage FET; mixed-mode FinFET device; planar FET; pulse broadening; pulse shrinking; CMOS integrated circuits; Circuit faults; Delay; FinFETs; Integrated circuit modeling; Logic gates; Semiconductor device modeling; Device simulation; FinFETs; fault models; independent-gate structure; leakage; shorted-gate structure;
  • fLanguage
    English
  • Journal_Title
    Nanotechnology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1536-125X
  • Type

    jour

  • DOI
    10.1109/TNANO.2011.2169807
  • Filename
    6032105