DocumentCode :
1337515
Title :
A proportional hazards approach to correlate SiO2-breakdown voltage and time distributions
Author :
Chan, C.K.
Author_Institution :
AT&T Bell Lab., Whippany, NJ, USA
Volume :
39
Issue :
2
fYear :
1990
fDate :
6/1/1990 12:00:00 AM
Firstpage :
147
Lastpage :
150
Abstract :
A new relationship for correlatingtime-to-breakdown and voltage-to-breakdown distributions is derived within the framework of proportional hazards models. The relationship is used to analyze the silicon dioxide breakdown data of D. Wolters, T. Hoogestyn, and H. Kraaij (WHK) (in The Physics of MOS Insulators, p.349-52, 1980). From the WHK data, the acceleration factor for every 1 MV/cm change in the applied electric field is estimated to be 100.7 at 300°C. The relationship can be used to estimate quickly the electric-field acceleration factor, using the time-to-breakdown data measured at one fixed voltage and the voltage-to-breakdown data measured at a single voltage ramp rate
Keywords :
electric breakdown of solids; insulating thin films; reliability; silicon compounds; 300 degC; SiO2 films; electric-field acceleration factor; proportional hazards approach; reliability; time-to-breakdown; voltage-to-breakdown; Accelerometers; Breakdown voltage; Circuit testing; Electric breakdown; Electric variables measurement; Hazards; Histograms; Life estimation; Measurement standards; Silicon compounds;
fLanguage :
English
Journal_Title :
Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9529
Type :
jour
DOI :
10.1109/24.55873
Filename :
55873
Link To Document :
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