Title :
Improved photoluminescence and ferroelectric properties of (Bi3.6Eu0.4)Ti3O12 thin films via Li+ doping
Author :
Zhou, Hong ; Wu, Guangheng ; Gao, Feng ; Qin, Ni ; Bao, Dinghua
Author_Institution :
State Key Lab. of Optoelectron. Mater. & Technol., Sun Yat-Sen Univ., Guangzhou, China
fDate :
10/1/2010 12:00:00 AM
Abstract :
(Bi3.6Eu0.4)Ti3O12 (BEuT) thin films with different Li+ doping contents were prepared on fused silica and Pt/Ti/SiO2/Si substrates by chemical solution deposition, and the effects of Li+ doping contents on the photoluminescence and ferroelectric properties of the thin films were investigated in detail. The results showed that an appropriate amount of Li+ doping could effectively improve emission intensities for two characteristic Eu3+ emission transitions of 5D0→7F1 (594 nm) and 5D0→7F2 (617 nm) compared with BEuT thin films without Li doping. This photoluminescence improvement can be attributed to the dual roles of Li+ ions, one of which is that Li ions can act as co-activators which are helpful to the energy transfer from the host to the Eu3+ ions, leading to a higher quantum yield; the other is that Li ion doping can induce local distortion of crystal field surrounding the Eu3+ activator because Bi3+ and Li+ ions have different ionic radii. In addition, the Li+-doped BEuT thin films had larger remanent polarization than BEuT thin films without Li doping prepared under the same experimental conditions. These results suggest that Li+ doping is an effective way to improve photoluminescence and ferroelectric properties of the (Bi,Eu)4Ti3O12 thin films.
Keywords :
bismuth compounds; dielectric polarisation; doping; europium compounds; ferroelectric materials; ferroelectric thin films; lithium; photoluminescence; (Bi3.6Eu0.4)Ti3O12:Li; 5D0→7F2 transitions; D0→7F1 transitions; chemical solution deposition; crystal field distortion; doping; emission intensities; emission transitions; energy transfer; ferroelectric properties; fused silica; photoluminescence; quantum yield; remanent polarization; thin films; wavelength 594 nm; wavelength 617 nm; Art; Doping; Films; Ions; Photoluminescence; Silicon compounds; Substrates;
Journal_Title :
Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
DOI :
10.1109/TUFFC.2010.1669