Title :
Efficiency and Electron Leakage Characteristics in GaN-Based Light-Emitting Diodes Without AlGaN Electron-Blocking-Layer Structures
Author :
Ryu, Han-Youl ; Shim, Jong-In ; Kim, Cheol-Hoi ; Choi, Jin Hyoung ; Jung, Hyun Min ; Noh, Min-Soo ; Lee, Jong-Moo ; Nam, Eun-Soo
Author_Institution :
Dept. of Phys., Inha Univ., Incheon, South Korea
Abstract :
The authors investigate efficiency and electron leakage characteristics in GaN-based light-emitting diodes (LEDs) without AlGaN electron-blocking-layer (EBL) structures. Both simulation and electroluminescence (EL) measurement results show that the internal quantum efficiency decreases rapidly as the thickness of an undoped GaN interlayer between active layers and a p-GaN layer increases, which is caused by electron leakage from active layers to the p-GaN due to inefficient hole injection. However, photoluminescence (PL) measurement results show that the quality of active layers deteriorates as the interlayer thickness decreases. The EL and PL results imply that the optimization of the undoped GaN interlayer thickness is important for achieving high internal quantum efficiency in AlGaN-EBL-free LEDs.
Keywords :
III-V semiconductors; electroluminescence; gallium compounds; light emitting diodes; photoluminescence; wide band gap semiconductors; GaN; active layers; electroluminescence measurement; electron leakage; electron-blocking-layer structures; hole injection; interlayer thickness; internal quantum efficiency; light-emitting diodes; photoluminescence; undoped interlayer; Aluminum gallium nitride; Charge carrier processes; Current density; Gallium nitride; Light emitting diodes; Quantum well devices; AlGaN; InGaN; electron blocking layer (EBL); light-emitting diode (LED);
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2011.2170409