Novel capacitor process using diffusion barrier rounded by Si3N4 spacer for high density FRAM device

A novel capacitor process was successfully implemented in 4 Mb FRAM device by developing a barrier layer rounded by Si₃N₄ spacer (BRS) scheme. Using this process, it is possible to eliminate an undesired barrier etching damage, which is a major role in degrading ferroelectric properties. The novel capacitor process was generated by etching an Ir barrier layer and rounding the barrier by a Si₃N₄ spacer before preparing Pb(Zr/sub 1-x/Ti/sub x/)O₃ (PZT) films. It was observed that uniform sol-gel derived PZT films were prepared on the patterned Ir substrate by using Si₃N₄ spacer, which provides a smooth edge of the patterned cell. The contact resistance between bottom electrode and polysilicon plug after full integration was monitored below 700 /spl Omega/ per contact with contact size 0.6×0.6 (μm²). Compared to the ferroelectric capacitor damaged by barrier etching, the novel Pb(Zr/sub 1-x/Ti/sub x/)O₃ (PZT) capacitor exhibited a well-saturated Q-V curve. The fully processed novel capacitor having 1.2×1.2 (μm²) effective area displayed remnant polarization of 14 (μC/cm²) at an operating voltage of 3.0 V. The BRS ferroelectric capacitor showed a reliable retention property until 100 h at 125/spl deg/C. Same state retention (Qss) was stable with time up to 100 h while opposite state retention (Qos) showed a log-linear decay rate at 125/spl deg/C thermal stress.