DocumentCode
1339849
Title
Fabrication of low-loss and polarisation-insensitive 256 channel arrayed-waveguide grating with 25 GHz spacing using 1.5% Δ waveguides
Author
Hida, Y. ; Hibino, Y. ; Itoh, M. ; Sugita, A. ; Himeno, A. ; Ohmori, Y.
Author_Institution
Photonics Labs., NTT Corp., Ibaraki, Japan
Volume
36
Issue
9
fYear
2000
fDate
4/27/2000 12:00:00 AM
Firstpage
820
Lastpage
821
Abstract
A 256 channel arrayed waveguide grating with a 25 GHz spacing was fabricated on a 4 inch Si wafer using 1.5%Δ silica-based waveguides with a minimum bending radius of 2 mm. By improving the fabrication methods of 1.5%Δ waveguides, we have obtained an on-chip loss of 2.7-4.7 dB, a far-end crosstalk of <-40 dB and a polarisation-dependent wavelength shift of <0.025 nm
Keywords
diffraction gratings; optical arrays; optical fabrication; optical waveguide components; 2.7 to 4.7 dB; 4 inch; Si wafer; Si-SiO2; bending radius; channel arrayed waveguide grating; fabrication; far-end crosstalk; on-chip loss; polarisation-dependent wavelength shift; silica waveguide;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:20000598
Filename
843793
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