DocumentCode
1340180
Title
Sensor-Driven Reliability and Wearout Management
Author
Singh, Prashant ; Zhuo, Cheng ; Karl, Eric ; Blaauw, David ; Sylvester, Dennis
Author_Institution
Univ. of Michigan, Ann Arbor, MI, USA
Volume
26
Issue
6
fYear
2009
Firstpage
40
Lastpage
49
Abstract
In this article, we propose two new approaches to improve existing DRM (dynamic reliability management) methodology First, we propose reliability sensors that use small replicated circuits to directly measure device wearout on the chip. A direct degradation measurement by these sensors removes a layer of uncertainty introduced because of inaccurate calibration of the degradation models. Note that, despite using the degradation sensors, we still require the degradation models in order to make reliability projections for the chip´s remaining lifetime. Aggressive oxide thickness scaling has caused large vertical electric fields in MOSFET devices, a situation that makes oxide breakdown a crucial issue when supply voltage is not scaled as aggressively as transistor feature size. It therefore becomes increasingly difficult to ensure the reliability of ICs over their lifetime.
Keywords
MOSFET; integrated circuit measurement; integrated circuit reliability; integrated circuit testing; remaining life assessment; semiconductor device breakdown; DRM methodology; IC lifetime; MOSFET device; chip remaining lifetime; direct degradation measurement; dynamic reliability management; oxide breakdown; oxide thickness scaling; sensor-driven reliability; vertical electric fields; wearout management; Breakdown voltage; Calibration; Degradation; Lead compounds; MOSFETs; Semiconductor device measurement; Semiconductor device reliability; Technology management; Temperature sensors; Transistors; design and test; optimization; oxide breakdown; process variation; reliability; sensor; time-to-failure;
fLanguage
English
Journal_Title
Design & Test of Computers, IEEE
Publisher
ieee
ISSN
0740-7475
Type
jour
DOI
10.1109/MDT.2009.155
Filename
5340386
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