Title :
Transistor operation of 30-nm gate-length EJ-MOSFETs
Author :
Hawaura, H. ; Sakamoto, T. ; Baba, T. ; Ochiai, Y. ; Fujita, J. ; Matsui, S. ; Sone, J.
Author_Institution :
NEC Fundamental Res. Labs., Ibaraki, Japan
fDate :
3/1/1998 12:00:00 AM
Abstract :
We have fabricated electrically variable shallow junction metal-oxide-silicon field-effect transistors (EJ-MOSFET´s) to investigate transistor characteristics of ultrafine-gate MOSFET´s. By using EB direct writing onto an ultrahigh-resolution negative resist (calixarene), we achieved a gate length of 32 nm for the first time. The short-channel effects were effectively suppressed by electrically induced ultrashallow source/drain regions, and the fabricated device exhibited normal transistor characteristics even in the 32-nm gate-length regime at room temperature: an ON/OFF current ratio of 105 and a cut-off current of 20 pA/μm.
Keywords :
MOSFET; electron beam lithography; 30 nm; EB direct writing; EJ-MOSFET; ON/OFF current ratio; calixarene; cut-off current; electrically variable shallow junction metal-oxide-silicon field-effect transistor; gate length; short-channel effect; ultrafine-gate MOSFET; ultrahigh-resolution negative resist; ultrashallow source/drain region; Degradation; Doping; FETs; MOSFET circuits; Project management; Research and development management; Resists; Temperature; Voltage; Writing;
Journal_Title :
Electron Device Letters, IEEE