DocumentCode
1340869
Title
730 nm InAlGaAs SQW laser diodes grown by MOVPE using `ether-free´ and conventional `solution´ trimethylindium
Author
Roberts, J.S. ; Smith, L.M. ; Tihanyi, P.L.
Author_Institution
Dept. of Electron. & Electr. Eng., Sheffield Univ., UK
Volume
147
Issue
1
fYear
2000
fDate
2/1/2000 12:00:00 AM
Firstpage
7
Lastpage
9
Abstract
SQW GRINSCH laser diodes for high power operation at 730 nm have been fabricated using atmospheric pressure MOVPE. The SQW InAlGaAs gain region has been prepared using two different trimethylindium sources, consisting of either an N N-dimethyldodecylamine: TMI adduct solution of conventionally manufactured/purified TMI, or solid TMI (diethylether-free synthesis). Both TMI sources address the reduction of contamination associated with the solvent diethylether, commonly used in the preparative route to TMI. Furthermore, devices prepared from ether-free TMI show a lower threshold current and longer lifetime for the same waveguide geometry. The lowering of residual oxygen from TMI is thought to be the most likely reason for these material improvements
Keywords
III-V semiconductors; MOCVD; aluminium compounds; gallium arsenide; indium compounds; infrared sources; laser transitions; optical fabrication; quantum well lasers; vapour phase epitaxial growth; 730 nm; InAlGaAs SQW laser diodes; MOVPE; N N-dimethyldodecylamine; SQW GRINSCH laser diodes; SQW InAlGaAs gain region; adduct solution; atmospheric pressure MOVPE; diethylether-free synthesis; ether-free solution trimethylindium; high power operation; lower threshold current; residual oxygen; solid TMI; solvent diethylether; trimethylindium sources; waveguide geometry;
fLanguage
English
Journal_Title
Optoelectronics, IEE Proceedings -
Publisher
iet
ISSN
1350-2433
Type
jour
DOI
10.1049/ip-opt:20000195
Filename
844461
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