DocumentCode :
134111
Title :
Boron doped amorphous carbon on n-type silicon with low negative bias by using palm oil precursor
Author :
Ishak, A. ; Affendi, Irma Hidayanti ; Ahmed Azhar, Najwa Ezira ; Saurdi, I. ; Abdullah, Mohd Harun ; Malek, M.F. ; Rusop, M.
Author_Institution :
NANO - Electron. Centre, Univ. Teknol. MARA, Shah Alam, Malaysia
fYear :
2014
fDate :
27-29 May 2014
Firstpage :
178
Lastpage :
182
Abstract :
Boron doped heterojunction of amorphous carbon solar cell were successfully fabricated using palm oil precursor in the environment of low negative bias. The open circuit voltage (Voc), current density (JSC), fill factor (FF) and efficiency (%) of boron doped without the use of negative bias (a-C/n-Si) were approximately 0.128244, 0.452821mA/cm2, 0.255398, and 0.014831%, respectively. Meanwhile, the optimize of open circuit voltage (VOC), current density (JSC), fill factor and efficiency of a-C:B/n-Si fabricated by low negative bias were 0.265508V, 5.602622mA/cm2, 0.220737, and 0.328355%, respectively. The conversion efficiency of a-C:B has been improved under the influenced of low negative bias.
Keywords :
amorphous semiconductors; boron; silicon; solar cells; C:B-Si; amorphous carbon solar cell; boron doped amorphous carbon; boron doped heterojunction; current density; fill factor; low negative bias; n-type silicon; open circuit voltage; palm oil precursor; Boron; Carbon; Films; Heterojunctions; Photovoltaic cells; Substrates; Amorphous carbon; Boron; Negative bias; Palm-oil; Pyrolysis- CVD; carbon solar cell;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Technology Management and Emerging Technologies (ISTMET), 2014 International Symposium on
Conference_Location :
Bandung
Print_ISBN :
978-1-4799-3703-5
Type :
conf
DOI :
10.1109/ISTMET.2014.6936502
Filename :
6936502
Link To Document :
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