DocumentCode
1341217
Title
Technology for advanced high-performance microprocessors
Author
Bohr, Mark T. ; El-Mansy, Youssef A.
Author_Institution
Intel Corp., Hillsboro, OR, USA
Volume
45
Issue
3
fYear
1998
fDate
3/1/1998 12:00:00 AM
Firstpage
620
Lastpage
625
Abstract
This paper describes the development of logic technologies that meet the density, performance, power, and manufacturing requirements for advanced high-performance microprocessors. Aggressive scaling of MOS transistor dimensions along with reduced power supply provide devices with high performance, low power, and good reliability. Multiple layers of planarized aluminum interconnect with high aspect ratios are used to address the increasing importance of interconnect density and performance. Static RAM test vehicles with small 6-transistor cell sizes are used to develop these logic technologies and to provide early demonstrations of yield and performance capabilities. The manufacturing strategy includes development group ownership of the technology from inception to early manufacturing ramp, extensive reuse of prior generation process equipment and modules, and a “copy exactly” methodology to ensure successful process startup and ramp in multiple facilities
Keywords
SRAM chips; integrated circuit interconnections; integrated circuit technology; microprocessor chips; MOS transistor scaling; copy exactly methodology; development group ownership; equipment reuse; high-performance microprocessor; logic technology; low power circuit; manufacturing; multiple facility; planarized aluminum interconnect; process startup; ramp; reliability; static RAM; Costs; Delay; Integrated circuit interconnections; Isolation technology; Logic; MOSFETs; Manufacturing; Microprocessors; Transistors; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.661223
Filename
661223
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