• DocumentCode
    1341307
  • Title

    Radiation Effects in Pinned Photodiode CMOS Image Sensors: Pixel Performance Degradation Due to Total Ionizing Dose

  • Author

    Goiffon, Vincent ; Estribeau, Magali ; Marcelot, Olivier ; Cervantes, Paola ; Magnan, Pierre ; Gaillardin, Marc ; Virmontois, Cédric ; Martin-Gonthier, Philippe ; Molina, Romain ; Corbiére, Franck ; Girard, Sylvain ; Paillet, Philippe ; Marcandella, Claud

  • Author_Institution
    ISAE, Univ. de Toulouse, Toulouse, France
  • Volume
    59
  • Issue
    6
  • fYear
    2012
  • Firstpage
    2878
  • Lastpage
    2887
  • Abstract
    Several Pinned Photodiode (PPD) CMOS Image Sensors (CIS) are designed, manufactured, characterized and exposed biased to ionizing radiation up to 10 kGy(SiO2 ). In addition to the usually reported dark current increase and quantum efficiency drop at short wavelengths, several original radiation effects are shown: an increase of the pinning voltage, a decrease of the buried photodiode full well capacity, a large change in charge transfer efficiency, the creation of a large number of Total Ionizing Dose (TID) induced Dark Current Random Telegraph Signal (DC-RTS) centers active in the photodiode (even when the Transfer Gate (TG) is accumulated) and the complete depletion of the Pre-Metal Dielectric (PMD) interface at the highest TID leading to a large dark current and the loss of control of the TG on the dark current. The proposed mechanisms at the origin of these degradations are discussed. It is also demonstrated that biasing (i.e., operating) the PPD CIS during irradiation does not enhance the degradations compared to sensors grounded during irradiation.
  • Keywords
    CMOS image sensors; X-ray effects; dark conductivity; dosimetry; nuclear electronics; photodetectors; photodiodes; PPD CIS; buried photodiode full well capacity; charge transfer efficiency; dark current random telegraph signal; ionizing radiation; pinned photodiode CMOS image sensors; pinning voltage; pixel performance degradation; premetal dielectric interface; quantum efήciency; radiation effects; total ionizing dose; Active pixel sensors; CMOS image sensors; Dark current; Interface states; Ionizing radiation; Radiation effects; Radiation hardening; 4T pixel; APS; CMOS image sensor (CIS); DSM; MAPS; RHBD; active pixel sensor; buried photodiode; charge transfer; dark current; deep submicron process; interface states; ionizing radiation; monolithic active pixel sensor; photon transfer curve (PTC); pinned photodiode (PPD); pinning voltage; pre-metal dielectrics (PMD); quantum efficiency; radiation hardening; shallow trench isolation (STI); total ionizing dose (TID); trapped charge;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.2012.2222927
  • Filename
    6365395