DocumentCode :
1341529
Title :
Increased Single-Event Transient Pulsewidths in a 90-nm Bulk CMOS Technology Operating at Elevated Temperatures
Author :
Gadlage, Matthew J. ; Ahlbin, Jonathan R. ; Narasimham, Balaji ; Ramachandran, Vishwanath ; Dinkins, C.A. ; Pate, N.D. ; Bhuva, Bharat L. ; Schrimpf, Ronald D. ; Massengill, Lloyd W. ; Shuler, Robert L. ; McMorrow, Dale
Author_Institution :
Vanderbilt Univ., Nashville, TN, USA
Volume :
10
Issue :
1
fYear :
2010
fDate :
3/1/2010 12:00:00 AM
Firstpage :
157
Lastpage :
163
Abstract :
Combinational-logic soft errors are expected to be the dominant reliability issue for advanced technologies. One of the major factors affecting the soft-error rates is single-event transient (SET) pulsewidths. The SET pulsewidths, which are controlled by drift, diffusion, and parasitic bipolar-transistor parameters, are a strong function of operating temperature. In this paper, heavy-ion induced SET pulsewidths are reported at temperatures ranging from 25??C to 100??C, as measured with an autonomous SET capture circuit. Experimental and simulation results in a 90-nm bulk CMOS technology indicate an increase of as high as 37% in measured average SET pulsewidth with increasing operating temperature, with some pulses almost 2 ns long at higher temperatures. The increase in the SET pulsewidth can be explained by the dependence of parasitic bipolar-transistor characteristics on temperature.
Keywords :
CMOS logic circuits; bipolar transistors; combinational circuits; integrated circuit reliability; radiation hardening (electronics); autonomous SET capture circuit; bulk CMOS technology; combinational-logic soft errors; elevated temperatures; heavy-ion induced SET pulsewidths; parasitic bipolar-transistor parameters; single-event transient pulsewidths; size 90 nm; soft-error rates; temperature 25 degC to 100 degC; Ion radiation effects; single-event transient (SET); single-event upset; soft-error rate;
fLanguage :
English
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
1530-4388
Type :
jour
DOI :
10.1109/TDMR.2009.2036719
Filename :
5340671
Link To Document :
بازگشت