DocumentCode
1341675
Title
The change in refractive index of AlGaAs/GaAs single quantum wells due to impurity-induced mixing
Author
Li, E. Herbert ; Weiss, Bernard L.
Author_Institution
Dept. of Electron. & Electr. Eng., Surrey Univ., Guildford, UK
Volume
3
Issue
9
fYear
1991
Firstpage
787
Lastpage
789
Abstract
The authors report the results of some calculations of the effect of the width and shape of the quantum well on the change of the refractive index of a single 100 AA thick square GaAs quantum well with thick A1/sub 0.30/Ga/sub 0.70/As barriers. The refractive-index difference between implanted and unimplanted layers after impurity-induced mixing has been calculated for a variety of structures. The results show that a large refractive-index difference can be achieved for heavily mixed wide wells for use at longer wavelengths, while negative refractive-index changes can be predicted for the moderate mixing case. The application of these results to multiquantum-well waveguides also predicts the conditions for the transition between guiding and antiguiding in waveguides.<>
Keywords
III-V semiconductors; aluminium compounds; chemical interdiffusion; gallium arsenide; optical waveguides; refractive index; semiconductor quantum wells; 100 AA; AlGaAs/GaAs single quantum wells; GaAs-Al/sub 0.30/Ga/sub 0.70/As; III-V semiconductor; antiguiding; implanted layers; impurity-induced mixing; multiquantum-well waveguides; refractive index; unimplanted layers; Annealing; Gallium arsenide; Impurities; Optical device fabrication; Optical refraction; Optical waveguides; Quantum well devices; Refractive index; Shape; Temperature;
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/68.84493
Filename
84493
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