• DocumentCode
    1341675
  • Title

    The change in refractive index of AlGaAs/GaAs single quantum wells due to impurity-induced mixing

  • Author

    Li, E. Herbert ; Weiss, Bernard L.

  • Author_Institution
    Dept. of Electron. & Electr. Eng., Surrey Univ., Guildford, UK
  • Volume
    3
  • Issue
    9
  • fYear
    1991
  • Firstpage
    787
  • Lastpage
    789
  • Abstract
    The authors report the results of some calculations of the effect of the width and shape of the quantum well on the change of the refractive index of a single 100 AA thick square GaAs quantum well with thick A1/sub 0.30/Ga/sub 0.70/As barriers. The refractive-index difference between implanted and unimplanted layers after impurity-induced mixing has been calculated for a variety of structures. The results show that a large refractive-index difference can be achieved for heavily mixed wide wells for use at longer wavelengths, while negative refractive-index changes can be predicted for the moderate mixing case. The application of these results to multiquantum-well waveguides also predicts the conditions for the transition between guiding and antiguiding in waveguides.<>
  • Keywords
    III-V semiconductors; aluminium compounds; chemical interdiffusion; gallium arsenide; optical waveguides; refractive index; semiconductor quantum wells; 100 AA; AlGaAs/GaAs single quantum wells; GaAs-Al/sub 0.30/Ga/sub 0.70/As; III-V semiconductor; antiguiding; implanted layers; impurity-induced mixing; multiquantum-well waveguides; refractive index; unimplanted layers; Annealing; Gallium arsenide; Impurities; Optical device fabrication; Optical refraction; Optical waveguides; Quantum well devices; Refractive index; Shape; Temperature;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/68.84493
  • Filename
    84493