Title :
ARROW´s in KTiOPO4
Author :
Gehler, J. ; Karthe, W. ; Wachter, C. ; Brauer, A. ; Rasch, A. ; Rottschalk, M.
Author_Institution :
Fraunhofer Inst. of Appl. Opt. & Precision Eng., Jena, Germany
fDate :
4/1/1997 12:00:00 AM
Abstract :
Antiresonant reflecting optical waveguides (ARROW´s) have been designed and fabricated in z-cut KTiOPO4 (KTP) by e-beam direct writing and double Rb/spl rlhar2/K ion exchange. Strong diffusion anisotropy allows the realization of ARROW´s in this electrooptical crystal. It was found, that argon-ion dry etching of the crystal surface prevents the ion exchange process totally. Using this as a new masking technique, antiresonant reflectors with lateral tolerances of less than 0.1 μm could be realized. Typical quasi-single-mode waveguiding and attenuation of about 1.0 dB/cm were observed at /spl lambda/=860 mm, which are in good agreement with our simulations made by the vectorial finite element method and effective index approach.
Keywords :
electron beam lithography; finite element analysis; integrated optics; ion exchange; light reflection; optical design techniques; optical fabrication; optical waveguides; potassium compounds; sputter etching; titanium compounds; 1.0 dB; 860 nm; ARROW; Ar-ion dry etching; KTiOPO/sub 4/:Rb,K; antiresonant reflecting optical waveguides; attenuation; crystal surface; double Rb-K ion exchange; effective index approach; electron-beam direct writing; electrooptical crystal; lateral tolerances; masking technique; quasi-single-mode waveguiding; strong diffusion anisotropy; vectorial finite element method; z-cut KTiOPO/sub 4/; Anisotropic magnetoresistance; Attenuation; Dry etching; Geometrical optics; Optical attenuators; Optical design; Optical surface waves; Optical waveguides; Particle beam optics; Writing;
Journal_Title :
Photonics Technology Letters, IEEE
