DocumentCode :
1342269
Title :
A microcomputer-based novel deposition controller for preparing films with graded composition
Author :
Shivalingappa, L. ; Rao, K.Narasimha ; Mohan, S.
Author_Institution :
Dept. of Instrum., Indian Inst. of Sci., Bangalore, India
Volume :
36
Issue :
3
fYear :
2000
Firstpage :
928
Lastpage :
934
Abstract :
A novel microcomputer-based electron beam (EB) deposition technique has been developed for preparing thin films with graded composition. A conventional EB gun crucible has been modified to accommodate two constituent materials. Necessary electronic hardware and a software-based INTEL 8085 microcomputer have been built to provide the crucible rotation with the required speed and for changing the emission currents for the EB gun. Mixed oxide films of CeO2 and SiO 2 with composition varying along their thicknesses have been prepared. The composition gradation has been altered by varying the deposition rate and rotational speed of individual constituents. The atomic percentages of Ce, Si, and O have been computed from deposition parameters and correlated with the data obtained from Auger spectroscopy
Keywords :
Auger electron spectroscopy; cerium compounds; electron beam deposition; electron guns; microcomputer applications; silicon compounds; vacuum deposited coatings; vacuum deposition; 6 kW; Auger spectroscopy; CeO2; CeO2-SiO2; SiO2; atomic percentages; crucible rotation; electron beam deposition technique; electron beam gun crucible; electronic hardware; emission currents; graded composition films; microcomputer-based deposition controller; mixed oxide films; software-based INTEL 8085 microcomputer; thickness variation; Electron beams; Gases; Hardware; Industry Applications Society; Microcomputers; Optical films; Process control; Sputtering; Substrates; Weight control;
fLanguage :
English
Journal_Title :
Industry Applications, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-9994
Type :
jour
DOI :
10.1109/28.845074
Filename :
845074
Link To Document :
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