DocumentCode :
1342280
Title :
A Statistical Approach to Microdose Induced Degradation in FinFET Devices
Author :
Griffoni, Alessio ; Gerardin, Simone ; Roussel, Philippe J. ; Degraeve, Robin ; Meneghesso, Gaudenzio ; Paccagnella, Alessandro ; Simoen, Eddy ; Claeys, Cor
Author_Institution :
IMEC, Leuven, Belgium
Volume :
56
Issue :
6
fYear :
2009
Firstpage :
3285
Lastpage :
3292
Abstract :
We study the variability of microdose effects induced by heavy-ion strikes on FinFETs. We model the effects through a statistical analysis, which considers the three-dimensional nature of these devices and overlapping ion hits. The analysis carried out in this work is based on a large amount of experimental data and on the reliability distribution functions (Poisson area scaling, LogNormal distribution, Weibull distribution, etc.), commonly used to estimate the time and charge to breakdown for accelerated lifetime tests.
Keywords :
MOSFET; Weibull distribution; ion beam effects; normal distribution; semiconductor device reliability; statistical analysis; FinFET Devices; Weibull distribution; heavy-ion strikes; log-normal distribution; microdose induced degradation; reliability distribution functions; statistical analysis; CMOS process; Degradation; Electric breakdown; FinFETs; Life estimation; Lifetime estimation; Radiation effects; Single event upset; Statistical analysis; Weibull distribution; FinFET; Weibull distribution; heavy-ion irradiation; microdose;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2009.2033365
Filename :
5341343
Link To Document :
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