DocumentCode :
1342335
Title :
A contamination-free microstructure in a humid environment by means of a combination of hydrophilic and hydrophobic surfaces
Author :
Abe, Takeshi
Author_Institution :
Frontier Technol. Res. Inst., Tokyo Gas Co. Ltd., Yokohama, Japan
Volume :
7
Issue :
1
fYear :
1998
fDate :
3/1/1998 12:00:00 AM
Firstpage :
94
Lastpage :
101
Abstract :
A novel concept that prevents dust particles, which are often formed in wet/dry ambient cycles, from contaminating microstructure surfaces is presented. It is shown that a geometrical combination of hydrophilic and hydrophobic surfaces can prevent the contamination on a part of the hydrophobic surface. The driving force of the mechanism is generated by the surface tension force of condensed water on the surface. Formation of isolated water droplets which become nuclei of contamination is prevented by controlling the dynamic behavior of the condensed water. It is also shown that the hydrophilic surface can be realized by forming concave patterns on a hydrophobic surface with conventional silicon etching. This greatly reduces the fabrication steps of the hybrid surface, making the proposed technique realistic
Keywords :
environmental degradation; etching; humidity; micromechanical devices; surface contamination; surface tension; Si; condensed water; contamination; droplet formation; dust particle; fabrication; humid environment; hybrid surface; hydrophilic surface; hydrophobic surface; microstructure; nucleation; silicon etching; surface tension force; Atom optics; Fabrication; Microstructure; Optical microscopy; Optical sensors; Silicon; Surface cleaning; Surface contamination; Surface tension; Water pollution;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/84.661390
Filename :
661390
Link To Document :
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