DocumentCode :
1342458
Title :
Ir/n-ZnO Schottky Barrier Ultraviolet Photodiodes
Author :
Young, S.J.
Author_Institution :
Dept. of Electron. Eng., Nat. Formosa Univ., Yunlin, Taiwan
Volume :
11
Issue :
5
fYear :
2011
fDate :
5/1/2011 12:00:00 AM
Firstpage :
1129
Lastpage :
1133
Abstract :
ZnO Schottky barrier photodiodes (PDs) with Iridium (Ir) contact electrodes were fabricated in this study. We could reduce the reverse leakage current and improve the performance of ZnO ultraviolet (UV) PDs by using 500°C, O2 annealing. This could be attributed to the formation of IrO2 after thermal annealing. With -1 V applied bias, it was found that the reverse current for nonannealed and 500°C, O2 annealed PDs were 4.46 × 10- 9 and 8.87 × 10-11 A, respectively. It was also found that we could enhance UV-to-visible rejection ratio, reduce noise level, and enhance the detectivity by high-temperature oxygen annealing.
Keywords :
II-VI semiconductors; Schottky diodes; annealing; electrochemical electrodes; iridium compounds; leakage currents; photodetectors; photodiodes; wide band gap semiconductors; zinc compounds; Ir-ZnO; IrO2; Schottky barrier ultraviolet photodiode; UV-to-visible rejection ratio; contact electrode; high-temperature oxygen annealing; leakage current; temperature 500 degC; thermal annealing; voltage -1 V; Ir; Schottky; ZnO; photodiodes; ultraviolet;
fLanguage :
English
Journal_Title :
Sensors Journal, IEEE
Publisher :
ieee
ISSN :
1530-437X
Type :
jour
DOI :
10.1109/JSEN.2010.2083649
Filename :
5594608
Link To Document :
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