DocumentCode :
1343817
Title :
A minimum total power methodology for projecting limits on CMOS GSI
Author :
Bhavnagarwala, Azeez J. ; Austin, Blanca L. ; Bowman, Keith A. ; Meindl, James D.
Author_Institution :
Microelectron. Res. Center, Georgia Inst. of Technol., Atlanta, GA, USA
Volume :
8
Issue :
3
fYear :
2000
fDate :
6/1/2000 12:00:00 AM
Firstpage :
235
Lastpage :
251
Abstract :
A circuit design methodology minimizing total power drain of a static complementary metal-oxide-semiconductor (CMOS) random logic network for a prescribed performance, operating temperature range, and short channel threshold voltage rolloff is investigated. Physical, continuous, smooth, and compact "transregional" MOSFET drain current models that consider high-field effects in scaled devices and permit tradeoffs between saturation drive current and subthreshold leakage current are employed to model CMOS circuit performance and power dissipation at low voltages. Transregional models are used in conjunction with physical short channel MOSFET threshold voltage rolloff models and stochastic interconnect distributions to project optimal supply voltages, threshold voltages, and device channel widths minimizing total power dissipated by CMOS logic circuits for each National Technology Roadmap for Semiconductors (NTRS) technology generation. Optimum supply voltage, corresponding to minimum total power dissipation, is projected to scale to 510 mV for the 50-nm 10-GHz CMOS generation in the year 2012. Techniques exploiting datapath parallelism to further scale the supply voltage are shown to offer decreasing reductions in power dissipation with technology scaling.
Keywords :
CMOS logic circuits; ULSI; circuit CAD; integrated circuit interconnections; integrated circuit modelling; leakage currents; low-power electronics; 10 GHz; 50 nm; 510 mV; CMOS GSI; CMOS circuit performance; National Technology Roadmap; circuit design methodology; datapath parallelism; device channel widths; high-field effects; minimum total power dissipation; minimum total power methodology; operating temperature range; saturation drive current; short channel MOSFET threshold voltage rolloff models; short channel threshold voltage rolloff; static complementary metal-oxide-semiconductor random logic network; stochastic interconnect distributions; subthreshold leakage current; technology scaling; threshold voltages; total power drain; transregional MOSFET drain current models; CMOS logic circuits; CMOS technology; Circuit synthesis; Logic devices; MOSFET circuits; Power MOSFET; Power dissipation; Power generation; Semiconductor device modeling; Threshold voltage;
fLanguage :
English
Journal_Title :
Very Large Scale Integration (VLSI) Systems, IEEE Transactions on
Publisher :
ieee
ISSN :
1063-8210
Type :
jour
DOI :
10.1109/92.845891
Filename :
845891
Link To Document :
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