DocumentCode :
1344544
Title :
Development of low noise, back-side illuminated silicon photodiode arrays
Author :
Holland, S.E. ; Wang, N.W. ; Moses, W.W.
Author_Institution :
Lawrence Livermore Nat. Lab., CA, USA
Volume :
44
Issue :
3
fYear :
1997
fDate :
6/1/1997 12:00:00 AM
Firstpage :
443
Lastpage :
447
Abstract :
We have developed low noise, high quantum efficiency photodiode arrays for use with positron-emission tomography (PET). A fabrication process developed for high-energy physics detectors was modified to allow for back-side illumination. A back-side contact consisting of a thin (10 nm) n+ polysilicon layer covered by an indium tin oxide (ITO) antireflection coating (57 nm) results in >70% quantum efficiency over the wavelength range of 400-1000 nm. The photodiodes are operated fully depleted (300 μm thick) resulting in a measured capacitance of 3.2 pF and typical leakage currents of 20-50 pA for a 3 mm square element. At room temperature the noise measured at a shaping time of 4 μs is 140 e- rms. When coupled to a CsI(TI) scintillator and excited with 141 keV gamma rays, the energy resolution is 12% fwhm
Keywords :
leakage currents; photodiodes; positron emission tomography; silicon radiation detectors; 20 to 50 pA; 3.2 pF; 300 mum; 400 to 1000 nm; CsI(TI) scintillator; PET; Si; antireflection coating; high quantum efficiency photodiode arrays; high-energy physics detectors; indium tin oxide; low noise back-side illuminated silicon photodiode arrays; positron-emission tomography; Detectors; Fabrication; Indium tin oxide; Lighting; Photodiodes; Physics; Positron emission tomography; Silicon; Temperature measurement; Wavelength measurement;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.603687
Filename :
603687
Link To Document :
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