DocumentCode :
1344889
Title :
Anisotropic Jc-/spl thetav/ measurements at low fields on a-MoSi thin films: evidence of a two-dimensional regime
Author :
Stephens, G.
Author_Institution :
Dept. of Mater. Sci., Cambridge Univ., UK
Volume :
8
Issue :
1
fYear :
1998
fDate :
3/1/1998 12:00:00 AM
Firstpage :
34
Lastpage :
37
Abstract :
Transport critical current versus applied field inclination (Jc-/spl thetav/ plots) have been made on a-MoSi thin films in low fields of order 0.04 T. The applied field was rotated (at fixed magnitude) in a plane both parallel (/spl phi/=0/spl deg/) and perpendicular (/spl phi/=90/spl deg/) to the film´s longitudinal axis. The results indicate a Jc governed by the perpendicular component of the applied field as is sometimes observed in the layered high-temperature superconducting (HTS) thin films. These results also suggest that the peaks in the Jc-/spl thetav/ occur when the vortex density coming from external sources becomes comparable to that induced internally from the self field of the transport current. A broad peak in the Jc when the field is incident perpendicular to the film surface is observed on the silicon substrate film but not on the sapphire substrate film. Possible reasons for this broad peak are discussed.
Keywords :
amorphous state; critical currents; magnetic fields; molybdenum compounds; sputtered coatings; superconducting thin films; type II superconductors; 0.04 T; Al/sub 2/O/sub 3/; Jc-/spl thetav/ plots; MoSi-Al/sub 2/O/sub 3/; MoSi-Si; Si; Si substrate film; a-MoSi thin films; anisotropic Jc-/spl thetav/ measurements; applied field inclination; low magnetic fields; perpendicular component; sapphire substrate film; transport critical current; two-dimensional regime; vortex density; Anisotropic magnetoresistance; High temperature superconductors; Semiconductor films; Silicon; Sputtering; Substrates; Superconducting coils; Superconducting films; Superconducting thin films; Transistors;
fLanguage :
English
Journal_Title :
Applied Superconductivity, IEEE Transactions on
Publisher :
ieee
ISSN :
1051-8223
Type :
jour
DOI :
10.1109/77.662693
Filename :
662693
Link To Document :
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