• DocumentCode
    1345586
  • Title

    Effect of helical slow-wave circuit variations on TWT cold-test characteristics

  • Author

    Kory, Carol L. ; Dayton, James A., Jr.

  • Author_Institution
    Analex Corp., NASA Lewis Res. Center, Cleveland, OH, USA
  • Volume
    45
  • Issue
    4
  • fYear
    1998
  • fDate
    4/1/1998 12:00:00 AM
  • Firstpage
    972
  • Lastpage
    976
  • Abstract
    Recent advances in the state of the art of computer modeling offer the possibility for the first time to evaluate the effect that slow-wave structure parameter variations, such as manufacturing tolerances, have on the cold-test characteristics of helical traveling-wave tubes (TWTs). This will enable manufacturers to determine the cost effectiveness of controlling the dimensions of the component parts of the TWT, which is almost impossible to do experimentally without building a large number of tubes and controlling several parameters simultaneously. The computer code MAFIA is used in this analysis to determine the effect on dispersion and on-axis interaction impedance of several helical slow-wave circuit parameter variations, including thickness and relative dielectric constant of the support rods, tape width, and height of the metallized films deposited on the dielectric rods. Previous computer analyzes required so many approximations that accurate determinations of the effect of many relevant dimensions on tube performance were practically impossible
  • Keywords
    computer aided analysis; dispersion (wave); electrical engineering computing; permittivity; slow wave structures; MAFIA; TWT cold-test characteristics; computer modeling; dispersion; helical slow-wave circuit variations; manufacturing tolerances; metallized film height; on-axis interaction impedance; parameter variations; relative dielectric constant; support rods; tape width; Buildings; Circuit analysis computing; Computer aided manufacturing; Costs; Dielectric constant; Dispersion; Impedance; Metallization; Thick film circuits; Virtual manufacturing;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.662813
  • Filename
    662813