Title : 
Electrostatic Tuning to Achieve Higher Stability Microelectromechanical Composite Resonators
         
        
            Author : 
Lee, Hyung Kyu ; Melamud, Renata ; Kim, Bongsang ; Hopcroft, Matthew A. ; Salvia, James C. ; Kenny, Thomas W.
         
        
            Author_Institution : 
Dept. of Mech. Eng., Stanford Univ., Stanford, CA, USA
         
        
        
        
        
        
        
            Abstract : 
Electrostatic tuning of the frequency in micromachined Si-SiO2 composite resonators for temperature compensation is demonstrated and analyzed. Electrostatic tuning exploits the bias voltage dependence of frequency for the compensation. Si-SiO2 composite resonators have intrinsically small frequency variation over temperature, thus being appropriate for electrostatic tuning. We developed a tuning procedure and applied it to a flexural-mode composite resonator. Experimental results show ±2.5-ppm stability over a 90°C-wide temperature range.
         
        
            Keywords : 
compensation; electrostatics; micromechanical resonators; silicon; silicon compounds; tuning; Si-SiO2; bias voltage dependence; electrostatic tuning; flexural-mode composite resonator; microelectromechanical composite resonators; micromachined composite resonators; temperature compensation; Circuit stability; Electrostatic processes; Resonant frequency; Stability analysis; Temperature measurement; Thermal stability; Composite resonators; electrostatic tuning; oscillators; temperature compensation;
         
        
        
            Journal_Title : 
Microelectromechanical Systems, Journal of
         
        
        
        
        
            DOI : 
10.1109/JMEMS.2011.2168083