DocumentCode :
1346467
Title :
Analysis and Design of Hanle-Effect Spin Transistors at 300 K
Author :
Takamura, Y. ; Sugahara, S.
Author_Institution :
Dept. of Electron. & Appl. Phys., Tokyo Inst. of Technol., Yokohama, Japan
Volume :
2
fYear :
2011
fDate :
7/3/1905 12:00:00 AM
Firstpage :
3000404
Lastpage :
3000404
Abstract :
We propose a new Hanle-effect device based on a MOSFET type of spin transistor to reveal the dynamics of spin-polarized electron transport in the Si MOS inversion channel. The proposed device has the ability to detect spin signals with high sensitivity and to distinguish spin transport signals from other, spurious signals. Spin transport behavior induced by the Hanle effect in the device were theoretically analyzed and were well correlated with the universality of electron mobility in the MOS inversion channel. The Hanle-effect spin device can elucidate the true nature of spin transport in Si MOS inversion channels.
Keywords :
Hanle effect; MOSFET; silicon; spin polarised transport; Hanle-effect spin transistors; MOS inversion channel; MOSFET; Si; spin-polarized electron transport; Junctions; MOSFET circuits; Magnetic tunneling; Phonons; Scattering; Silicon; Transistors; Spin electronics; magnetic devices; semiconductor devices; spin-polarized transport;
fLanguage :
English
Journal_Title :
Magnetics Letters, IEEE
Publisher :
ieee
ISSN :
1949-307X
Type :
jour
DOI :
10.1109/LMAG.2011.2166378
Filename :
6041054
Link To Document :
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