Title :
Development of Chip Separation Technique for InGaN-Based Light Emitting Diodes
Author :
Lee, Jae-Hoon ; Kim, Nam-Seung ; Lee, Jung-Hee
Author_Institution :
GaN Power Res. Group, Samsung LED Co. Ltd., Suwon, South Korea
Abstract :
We compare the chip separation techniques for InGaN-based light emitting diode (LED), which are prepared by conventional diamond tip scribing and short pulse laser scribing with pulse width of nanosecond or femtosecond. Differently from the diamond tip scribing, the laser scribing does not suffer from the shallow scribing depth, which usually results in a failure in cleaving the wafer along the scribed line. Furthermore, the LED scribed by using a femtosecond pulse laser exhibits an 11% enhancement in the output power at 20 mA, compared to that by using a nanosecond pulse laser. This is because the femtosecond laser scribing not only eliminates particle generation, but also minimizes the effect of thermal damage on the sapphire substrate. The femtosecond laser also offers a high speed, high yield, and hence low cost scribing process due to its extremely short pulse width and deep focal length.
Keywords :
III-V semiconductors; gallium compounds; indium compounds; laser materials processing; light emitting diodes; sapphire; wide band gap semiconductors; Al2O3; InGaN; chip separation; current 20 mA; deep focal length; diamond tip scribing; femtosecond laser scribing; femtosecond pulse laser; light emitting diodes; nanosecond pulse laser; particle generation; pulse width; sapphire substrate; scribed line; shallow scribing depth; short pulse laser scribing; thermal damage; Laser ablation; Light emitting diodes; Substrates; Ablation; InGaN; diamond tip scribing; femtosecond laser scribing; light-emitting diode; nanosecond laser scribing; particle;
Journal_Title :
Quantum Electronics, IEEE Journal of
DOI :
10.1109/JQE.2011.2171327