DocumentCode
1348716
Title
Design and Fabrication of 0/1-Level RF-Via Interconnect for RF-MEMS Packaging Applications
Author
Hsu, Li-Han ; Wu, Wei-Cheng ; Chang, Edward Yi ; Zirath, Herbert ; Wu, Yun-Chi ; Wang, Chin-Te ; Lee, Ching-Ting
Author_Institution
Mater. Sci. & Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
Volume
33
Issue
1
fYear
2010
Firstpage
30
Lastpage
36
Abstract
This paper presents the parametric study of RF-via (0-level) and flip-chip bump (1-level) transitions for applications of packaging coplanar RF-MEMS devices. The key parameters were found to be the bumps´ and vias´ positions and the overlap of the metal pads, which should be carefully considered in the entire two levels of packages. The length of the backside transmission line, determining the MEMS substrate area, showed minor influence on the interconnect performance. With the experimental results, the design rules have been developed and established. The optimized interconnect structure for the two levels of packages demonstrates the return loss beyond 15 dB and the insertion loss within 0.6 dB from dc to 60 GHz.
Keywords
flip-chip devices; integrated circuit interconnections; micromechanical devices; packaging; transmission lines; 0/1-level RF-via interconnect; MEMS substrate area; RF-MEMS packaging; coplanar RF-MEMS devices; flip chip bump; metal pads; parametric study; transmission line; Fabrication; interconnections; microelectromechanical devices; microwave technology; packaging;
fLanguage
English
Journal_Title
Advanced Packaging, IEEE Transactions on
Publisher
ieee
ISSN
1521-3323
Type
jour
DOI
10.1109/TADVP.2009.2034137
Filename
5345704
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