DocumentCode :
1349064
Title :
Stability Analysis of Cr-MIS Solar Cells
Author :
Rajeswaran, G. ; Anderson, W.A. ; Thayer, M. ; Lee, B.W.
Author_Institution :
Department of Electrical and Computer Engineering; State University of New York at Buffalo; 4232 Ridge Lea Road; Amherst, New York 14226 USA.
Issue :
3
fYear :
1982
Firstpage :
276
Lastpage :
280
Abstract :
The 50 Ã… Cu/30 Ã… Cr/20 Ã… SiO,/Si solar cell structure has been analyzed by Auger, ESCA and ellipsometer measurements. An oxidation-reduction failure mechanism has been proposed for shelf-life degradation, and experimental evidence for such behavior is presented. The effect of this degradation is a decrease in the oxide thickness at the interface bringing about a photovoltaic performance degradation. The performance degradation involves a typical change in Voc, from about 0.55 V to 0.52 V with little or no change in Jsc or fill factor. The performance of all Cr-MIS devices then stabilizes when a thermodynamic equilibrium is attained. The light-effect degradation is more complex and the rearrangement of bonding in the interface oxide and at the SiOx/Si interface might reduce the rate of degradation. The Cr-MIS solar cell should be designed with an oxide thickness more than the static optimum value to allow for a decrease in oxide thickness to the optimum value.
Keywords :
Chromium; Degradation; Failure analysis; Life testing; Photovoltaic cells; Photovoltaic systems; Reliability engineering; Silicon; Solar power generation; Stability analysis; Degradation mechanism; MIS solar cell;
fLanguage :
English
Journal_Title :
Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9529
Type :
jour
DOI :
10.1109/TR.1982.5221337
Filename :
5221337
Link To Document :
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