DocumentCode :
1349634
Title :
Three-Dimensional Stackable Electromechanical Nonvolatile Memory Cell (H Cell) for Four-Bit Operation
Author :
Choi, Woo Young
Author_Institution :
Dept. of Electron. Eng., Sogang Univ., Seoul, South Korea
Volume :
31
Issue :
1
fYear :
2010
Firstpage :
29
Lastpage :
31
Abstract :
A novel H-cell design has been proposed and successfully demonstrated. To the best of the author´s knowledge, it is the first CMOS-compatible electromechanical nonvolatile memory that shows the feasibility of 4-bit operation experimentally. The fabricated prototype H cell shows a reasonable performance, except for the endurance property that will be overcome by reducing the cell size and introducing a new beam material. The H cell can be used for high-density and low-power 3-D stackable electromechanical nonvolatile memory.
Keywords :
CMOS memory circuits; random-access storage; 3D stackable electromechanical nonvolatile memory cell; CMOS-compatible electromechanical nonvolatile memory; H-cell design; four-bit operation; Electromechanical memory; H cell; multibit operation; nonvolatile memory;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2009.2035342
Filename :
5345845
Link To Document :
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