DocumentCode :
1349655
Title :
Plasma Immersion Ion Implantation Into Inner Surface of Cylindrical Bore Using Moving Auxiliary Electrode
Author :
Wang, Peng ; Tian, Xiubo ; Gong, Chunzhi ; Yang, Shiqin ; Chu, Paul K.
Author_Institution :
State Key Lab. of Adv. Welding Production & Technol., Harbin Inst. of Technol., Harbin, China
Volume :
39
Issue :
11
fYear :
2011
Firstpage :
3120
Lastpage :
3124
Abstract :
Plasma immersion ion implantation into inner surfaces of tubes has practical importance, but intrinsic drawbacks such as poor dose uniformity and small equivalent ion flux have limited wider applications. In this paper, a new technique utilizing a moving auxiliary electrode inside the tube to improve the dose uniformity and ion implantation efficiency is described. The effects of the moving auxiliary electrode are investigated by 2-D particle-in-cell simulation. The results show that, when the grounded auxiliary electrode is withdrawn along the axis of the tube, external ions are continuously attracted into the tube and implanted into the interior wall. It is verified by the incident dose peak when the auxiliary electrode is kept at a certain location inside the tube. Uniform ion implantation into a cylindrical bore can be accomplished by physical translation of the electrode, and this technique is suitable for implantation of long tubes without an internal plasma source.
Keywords :
electrodes; numerical analysis; plasma immersion ion implantation; plasma simulation; 2D particle-in-cell simulation; cylindrical bore; dose uniformity; equivalent ion flux; external ions; grounded auxiliary electrode; incident dose peak; interior wall; ion implantation efficiency; long tube implantation; moving auxiliary electrode; physical translation; plasma immersion ion implantation; tube axis; tube inner surface; uniform ion implantation; Educational institutions; Electrodes; Electron tubes; Ion implantation; Materials; Plasma sources; Moving auxiliary electrode; numerical simulation; particle-in-cell (PIC); plasma immersion ion implantation (PIII);
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2011.2162751
Filename :
6044725
Link To Document :
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