Design Criteria for Near-Ultraviolet GaN-Based Light-Emitting Diodes

We discuss, through numerical device simulation, a number of possible design approaches intended for optimizing the internal quantum efficiency (IQE) of light-emitting diodes based on InGaN quantum wells (QWs) grown along the c-axis emitting in the near-ultraviolet region. We study the effects on IQE of thickness, doping, and alloy composition of the electron and hole blocking layers in order to maximize the confinement of both carrier species in the active region. We discuss the selection of the number of QWs to be employed in the active region and their optimum width, and we show the comparatively minor effects of the thickness of the barrier layers. We also compare different strategies for barrier doping, confirming that a p-type doping in all barriers helps to compensate the spontaneous and piezoelectric surface charges and to enhance hole transport. Finally, we evaluate the impact of Auger recombination on IQE and its role in the experimentally observed efficiency droop. Whenever possible, we suggest practical design criteria and provide technologically feasible sets of design parameters.