DocumentCode :
1351
Title :
The Diamond Ordnance Fuze Laboratory´s Photolithographic Approach to Microcircuits
Author :
Lathrop, J.W.
Volume :
35
Issue :
1
fYear :
2013
fDate :
Jan.-March 2013
Firstpage :
48
Lastpage :
55
Abstract :
From 1952 to 1958, Jay Lathrop worked on a project at the National Bureau of Standards (later the US Army Diamond Ordnance Fuze Laboratory) to develop microminiaturized, transistorized hybrid integrated circuits for radio proximity fuzes. In this article, Lathrop describes his experiences during this project, the development of photolithography, and how photolithography became critical in the first efforts to produce semiconductor ICs.
Keywords :
monolithic integrated circuits; photolithography; diamond ordnance fuze laboratory; microcircuits; photolithography; radio proximity fuze; semiconductor IC; transistorized hybrid integrated circuits; Diamond-like carbon; Electron tubes; History; Lithography; NIST; National Bureau of Standards; Transistors; US Department of Defense; National Bureau of Standards; US Army Diamond Ordnance Fuze Laboratory; history of computing; integrated circuit; microcircuitry; photolithography; printed circuits; proximity fuze;
fLanguage :
English
Journal_Title :
Annals of the History of Computing, IEEE
Publisher :
ieee
ISSN :
1058-6180
Type :
jour
DOI :
10.1109/MAHC.2011.83
Filename :
6109207
Link To Document :
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