DocumentCode :
1353154
Title :
Low-Frequency Three-Terminal Charge Pumping Applied to Silicon Nanowire Field-Effect Transistors
Author :
Sarpatwari, K. ; Awadelkarim, O.O. ; Passmore, L.J. ; Ho, T.T. ; Kuo, M.W. ; Dellas, N.S. ; Mayer, T.S. ; Mohney, S.E.
Author_Institution :
Dept. of Eng. Sci. & Mech., Pennsylvania State Univ., University Park, PA, USA
Volume :
10
Issue :
4
fYear :
2011
fDate :
7/1/2011 12:00:00 AM
Firstpage :
871
Lastpage :
874
Abstract :
We report on the application of the charge-pumping (CP) technique to vapor-liquid-solid grown silicon nanowire (SiNW) transistors. We use an Ω gate-nanowire field-effect-transistor (OG-NWFET) structure, and we employ a modified CP method that is applicable to three terminal devices. The trap density from CP measurements correlates very well with the results obtained from subthreshold slope measurements. The relatively high trap densities measured and the observed saturation of the CP signal with the measurement frequency are discussed in terms of device dimensions and geometry.
Keywords :
elemental semiconductors; field effect transistors; nanowires; silicon; silicon compounds; Ω gate-nanowire field-effect-transistor; SiO2-Si; device dimensions; device geometry; high trap densities; low-frequency three-terminal charge pumping; measurement frequency; silicon nanowire field-effect transistors; subthreshold slope measurements; trap density; vapor-liquid-solid grown silicon nanowire transistors; Charge pumps; Current measurement; Density measurement; Electron traps; Frequency measurement; Logic gates; Silicon; Charge pumping (CP); nanowire field-effect transistors (NWFET);
fLanguage :
English
Journal_Title :
Nanotechnology, IEEE Transactions on
Publisher :
ieee
ISSN :
1536-125X
Type :
jour
DOI :
10.1109/TNANO.2010.2087392
Filename :
5604321
Link To Document :
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