• DocumentCode
    1354095
  • Title

    Extensive Nanotwinning: Origin of High Current Density to High Fields in Preform-Optimized Infiltration-Growth-Processed \\hbox {YBa}_{2}\\hbox {Cu}_{3}\\hbox {O}_{7 - \\delta }

  • Author

    Kumar, N. Devendra ; Rajasekharan, T. ; Gundakaram, Ravi C. ; Seshubai, Vummethala

  • Author_Institution
    Sch. of Phys., Univ. of Hyderabad, Hyderabad, India
  • Volume
    21
  • Issue
    6
  • fYear
    2011
  • Firstpage
    3612
  • Lastpage
    3620
  • Abstract
    The origin of high current densities to very high magnetic fields (better than 103 A · cm-2 to 6.5 T at 77 K) in YBa2Cu3O7-δ superconductor fabricated by the preform-optimized infiltration-growth process (POIGP) is investigated. The main techniques used in the paper are field-emission scanning electron microscopy and transmission electron microscopy (TEM). An electron-backscattered-diffraction study of the samples is also carried out. A comparison between the microstructures of the optimized sample with the nonoptimized ones show that extensive twinning on a nanometer scale with crossing twins occurring near the optimally separated Y2BaCuO5 precipitates can be the origin of the observed high Jc (H) in the POIGP sample. The TEM study reveals the presence of very fine defects starting from the twin boundaries. The observed defect spacing and densities account for the uniformly high current densities observed to high fields.
  • Keywords
    barium compounds; critical current density (superconductivity); electron backscattering; electron diffraction; field emission electron microscopy; high-temperature superconductors; scanning electron microscopy; transmission electron microscopy; twin boundaries; twinning; yttrium compounds; TEM; Y2BaCuO5 precipitates; YBa2Cu3O7-δ; YBa2Cu3O7-δ superconductor; current densities; defect spacing; electron-backscattered-diffraction; field emission scanning electron microscopy; high current density; magnetic fields; magnetic flux density 6.5 T; microstructures; nanotwinning; preform-optimized infiltration-growth process; temperature 77 K; transmission electron microscopy; twin boundaries; Current density; High temperature superconductors; Scanning electron microscopy; Superconducting magnets; Temperature measurement; Transmission electron microscopy; Yttrium barium copper oxide; Bulk high temperature superconductors; YBCO; high current density; infiltration growth process; twinning;
  • fLanguage
    English
  • Journal_Title
    Applied Superconductivity, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1051-8223
  • Type

    jour

  • DOI
    10.1109/TASC.2011.2168819
  • Filename
    6054016