DocumentCode :
1354736
Title :
Gate-voltage dependence of low-frequency noise in GaN/AlGaN heterostructure field-effect transistors
Author :
Balandin, A.
Author_Institution :
Dept. of Electr. Eng., California Univ., Riverside, CA, USA
Volume :
36
Issue :
10
fYear :
2000
fDate :
5/11/2000 12:00:00 AM
Firstpage :
912
Lastpage :
913
Abstract :
The gate-voltage dependence of low-frequency noise in GaN/AlGaN heterostructure field-effect transistors has been investigated in the linear and subsaturation regions. Analysis of experimental data for different transistors indicates that for all examined biases the noise spectrum is dominated by the channel noise rather than noise originating in the series resistors. The obtained results shed new light on the noise sources and may lead to improvements in the noise performance of GaN transistors
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; junction gate field effect transistors; semiconductor device noise; GaN-AlGaN; GaN/AlGaN heterostructure field effect transistor; gate voltage dependence; low-frequency noise;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20000680
Filename :
850525
Link To Document :
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