DocumentCode :
1355081
Title :
Relationship between empirical and theoretical mobility models in silicon inversion layers
Author :
Reichert, Guenter ; Ouisse, Thierry
Author_Institution :
Lab. de Phys. des Composants a Semicond., Grenoble, France
Volume :
43
Issue :
9
fYear :
1996
fDate :
9/1/1996 12:00:00 AM
Firstpage :
1394
Lastpage :
1398
Abstract :
The theoretical and empirical expressions most commonly used for modeling the variation of the low field surface mobility of MOSFETs are discussed. It is shown that both approaches may be reconciled, and a new physical definition of the parameters of the empirical model is presented, In particular, we propose an analytical formula of the factor θ2 characterizing the quadratic dependence of the reciprocal mobility on the inversion charge. Both the formula and experiment agree and show that θ2 does not only depend on the surface roughness scattering term, but also on phonon scattering
Keywords :
MOSFET; carrier mobility; electron-phonon interactions; inversion layers; semiconductor device models; silicon-on-insulator; surface scattering; &thetas;2 factor; 298 to 650 K; MOSFETs; SOI MOSFET; Si inversion layers; empirical model; inversion charge; low field surface mobility models; phonon scattering; quadratic dependence; reciprocal mobility; surface roughness scattering; Acoustic scattering; Joining processes; Mathematical model; Phonons; Polynomials; Rough surfaces; Scattering parameters; Silicon; Surface roughness; Temperature distribution;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.535324
Filename :
535324
Link To Document :
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